veldhuiswendy

Supercritical resist drying allows the fabrication of high aspect-ratio (AR) resist patterns. The potential of this drying technique to increase the maximum achievable AR and the resolution of the overall lithographic process is analyzed for Hydrogen SilsesQuioxane (HSQ). The maximum achievable AR is doubled compared to conventional nitrogen blow drying. Furthermore, the resolution is improved significantly.

Hi, Any one of You tell me because i am now in Java. Have you ever used HashTable and Directory in Java? and What is a JAR file? How to run Java Application??